发明名称 |
NOVEL PHENOL COMPOUNDS AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME |
摘要 |
PURPOSE: A positive type photosensitive composition is provided to improve physical properties and reliability of a membrane, and to boating excellent sensitivity, resolution, pattern formation, removal of residue, high elongation, high tensile strength, and low membrane shrinkage. CONSTITUTION: A phenol compound comprises one selected from a group consisting of a compound in chemical formula 1, a compound in chemical formula 2, and combinations thereof. A positive type photosensitive composition comprises 100.0 parts by weight of polybenzoxazole precursor, 5-100 parts by weight of a photosensitive diazoquinone compound, 1-30 parts by weight of a phenol compound, 0.1-30 parts by weight of a silane compound, and 50-300 parts by weight of a solvent. The polybenzoxazole precursor has the weight average molecular weight of 3,000-300,000.
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申请公布号 |
KR20120066923(A) |
申请公布日期 |
2012.06.25 |
申请号 |
KR20100128277 |
申请日期 |
2010.12.15 |
申请人 |
CHEIL INDUSTRIES INC.;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEONG, JI YOUNG;CHUNG, MIN KOOK;CHO, HYUN YONG;YOO, YONG SIK;LEE, JEONG WOO;LEE, JONG HWA;CHEON, HWAN SUNG;KIM, SOO YOUNG;KIM, YOUNG HO;KIM, JAE HYUN;PARK, SU MIN |
分类号 |
C07C69/84;G03F7/039;H01L21/02 |
主分类号 |
C07C69/84 |
代理机构 |
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代理人 |
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