发明名称 |
PATTERN DATA CONVERSION FOR LITHOGRAPHY SYSTEM |
摘要 |
A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data. |
申请公布号 |
EP2443647(A2) |
申请公布日期 |
2012.04.25 |
申请号 |
EP20100775887 |
申请日期 |
2010.05.17 |
申请人 |
MAPPER LITHOGRAPHY IP B.V. |
发明人 |
VAN DE PEUT, TEUNIS;WIELAND, MARCO JAN-JACO |
分类号 |
H01J37/317;G03F7/20 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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