发明名称 |
PRETREATMENT METHOD OF COMPONENT OF DEPOSITION DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pretreatment method of a component of a deposition device for efficiently forming a pre-coat layer where the particle amount is reduced for the component of the deposition device. <P>SOLUTION: This pretreatment method of the component of the deposition device includes a process of forming a thermal-sprayed metal layer by thermal spraying to the component of the deposition device before the component of the deposition device is used for the deposition device, and a process of vibrating the component of the deposition device having the thermal-sprayed metal layer and then performing air blow. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012052161(A) |
申请公布日期 |
2012.03.15 |
申请号 |
JP20100193795 |
申请日期 |
2010.08.31 |
申请人 |
KANSAI COKE & CHEM CO LTD;MC EVOLVE TECHNOLOGIES CORP |
发明人 |
UOTA SHOKI;YASUMARU JUNICHI;KUBOTA HOZO;KAMIGUCHI AKIHITO |
分类号 |
C23C4/08;C23C4/02;C23C4/18;C23C14/50 |
主分类号 |
C23C4/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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