发明名称 PRETREATMENT METHOD OF COMPONENT OF DEPOSITION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a pretreatment method of a component of a deposition device for efficiently forming a pre-coat layer where the particle amount is reduced for the component of the deposition device. <P>SOLUTION: This pretreatment method of the component of the deposition device includes a process of forming a thermal-sprayed metal layer by thermal spraying to the component of the deposition device before the component of the deposition device is used for the deposition device, and a process of vibrating the component of the deposition device having the thermal-sprayed metal layer and then performing air blow. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012052161(A) 申请公布日期 2012.03.15
申请号 JP20100193795 申请日期 2010.08.31
申请人 KANSAI COKE & CHEM CO LTD;MC EVOLVE TECHNOLOGIES CORP 发明人 UOTA SHOKI;YASUMARU JUNICHI;KUBOTA HOZO;KAMIGUCHI AKIHITO
分类号 C23C4/08;C23C4/02;C23C4/18;C23C14/50 主分类号 C23C4/08
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