发明名称 BEAM SHAPING OPTICAL SYSTEM AND SCANNING MICROSCOPE
摘要 <P>PROBLEM TO BE SOLVED: To convert the intensity distribution of an incident luminous flux into uniform distribution with small energy loss and a more compact configuration. <P>SOLUTION: The beam shaping optical system 11 is configured in a manner that the curvature radii and the conic constants of an incident surface 21 and an emission surface 22 are negative; when the radius of an exit pupil is expressed by D_exp, a difference of sag amounts of the incident surface 21 and the emission surface 22 at positions of each height h from an optical axis of the beam shaping optical system 11 is always positive in the range of 0<h<D_exp, and has at least one inflection point; when a height from the optical axis at the inflection point which has the lowest height from the optical axis out of the inflection points is expressed by h_infl, and the radius of the exit pupil of the beam shaping optical system 11 is expressed by D_ent, the difference of the sag amounts satisfies h_infl/D_ent<0.6; and a primary differential value of the difference of the sag amounts has two inflection points. Accordingly, one lens element shapes the intensity distribution of an incident luminous flux into uniform distribution. The beam shaping optical system can be applied to an aspherical lens. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012042513(A) 申请公布日期 2012.03.01
申请号 JP20100181014 申请日期 2010.08.12
申请人 NIKON CORP 发明人 SATAKA RYOICHI;MIZUTA MASAHIRO
分类号 G02B27/09;G02B13/00;G02B13/18;G02B21/06 主分类号 G02B27/09
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