| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ejection liquid dryness suppressing device and an ejection liquid dryness suppressing method in which variation of a forming position of a meniscus in a nozzle can be suppressed when a nozzle opening becomes a state opened from a state blocked through close contact by a contact surface, and to provide a liquid ejecting apparatus equipped with the ejection liquid dryness suppressing device. <P>SOLUTION: A nozzle contact means 40 is provided whereby the contact surface 40p presents a contact state in which the contact surface is in close contact with a nozzle formation surface 10p to block a plurality of nozzle openings, and a separated state in which the contact surface is separated from the nozzle formation surface 10p. The nozzle contact means 40 separates the contact surface 40p from the nozzle formation surface 10p to sequentially open the nozzle openings preferentially from the nozzle opening K1 of the nozzle NL1 with a shorter flow passage length RL of an ink L from a supply port 11 to the nozzle via a common ink chamber 13 among the plurality of nozzle openings in a procedure from the contact state to the separated state. <P>COPYRIGHT: (C)2012,JPO&INPIT |
