发明名称 |
ETCHING SOLUTION COMPOSITIONS FOR METAL LAMINATE FILMS |
摘要 |
Disclosed are etching solution compositions that comprise fluorine compounds and iron ions, which are used for bulk etching of metal laminate films wherein a layer comprising aluminum or an aluminum alloy is laminated on top and a layer comprising titanium or a titanium alloy on bottom, and an etching method using said etching solution compositions.
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申请公布号 |
US2011297873(A1) |
申请公布日期 |
2011.12.08 |
申请号 |
US201013201955 |
申请日期 |
2010.02.23 |
申请人 |
KUROIWA KENJI;NAGASHIMA KAZUAKI;KATO MASARU;MASAHIRO NOHARA;KANTO KAGAKU KABUSHIKI KAISHA;SHARP KABUSHIKI KAISHA |
发明人 |
KUROIWA KENJI;NAGASHIMA KAZUAKI;KATO MASARU;MASAHIRO NOHARA |
分类号 |
C09K13/08;C09K13/00;C23F1/00;C23F1/20;C23F1/26 |
主分类号 |
C09K13/08 |
代理机构 |
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代理人 |
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