发明名称 FILM STACKS AND METHODS THEREOF
摘要 <p>A method of manufacturing a plurality of spacers in a film stack includes forming at least one electrically-conductive element having sidewalls on a substrate, depositing a plurality of passivation layers proximate to the substrate, and performing etching on one of the plurality of passivation layers to form a plurality of spacers substantially across from the sidewalls of the at least one electrically-conductive element.</p>
申请公布号 WO2011133133(A1) 申请公布日期 2011.10.27
申请号 WO2010US31565 申请日期 2010.04.19
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;MARTY, VALERIE;COOK, GALEN 发明人 MARTY, VALERIE;COOK, GALEN
分类号 B32B27/08;H01B5/14 主分类号 B32B27/08
代理机构 代理人
主权项
地址