| 发明名称 |
HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system |
| 摘要 |
An HDP-CVD process is described, including a deposition step conducted in an HDP-CVD chamber and a pre-heating step that is performed outside of the HDP-CVD chamber before the deposition step and pre-heats a wafer to a temperature higher than room temperature and required in the HDP-CVD process deposition step.
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| 申请公布号 |
US8034691(B2) |
申请公布日期 |
2011.10.11 |
| 申请号 |
US20080193442 |
申请日期 |
2008.08.18 |
| 申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LUOH TUUNG;SU CHIN-TA;YANG TA-HUNG;CHEN KUANG-CHAO;LUO SHING-ANN |
| 分类号 |
H01L21/336 |
主分类号 |
H01L21/336 |
| 代理机构 |
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