| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a positive radiation-sensitive composition which is based on polysiloxane, allows formation of an interlayer insulation film having high flatness or evenness of thickness without application irregularity, and has excellent radiation-sensitivity and development margin; the interlayer insulating film formed of the composition; and a method of forming the interlayer insulation film. <P>SOLUTION: The positive radiation-sensitive composition includes a copolymer compound having a structural unit derived from: [A] a siloxane polymer; [B] a quinone-diazide compound; and [C] a polymer compound having (c1) alkyl fluoride (meta)acrylate monomer, (c2) (meta)acrylate monomer including oxyalkylene group in its side chain, and (c3) siloxane group. <P>COPYRIGHT: (C)2011,JPO&INPIT |
