发明名称 IMPRINT LITHOGRAPHY.
摘要 An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.
申请公布号 NL2005434(A) 申请公布日期 2011.06.21
申请号 NL20102005434 申请日期 2010.10.01
申请人 ASML NETHERLANDS B.V. 发明人 WUISTER, SANDER;BOEF, ARIE;KRUIJT-STEGEMAN, YVONNE
分类号 G03F7/00 主分类号 G03F7/00
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