发明名称 METHOD OF MANUFACTURING WAFER LEVEL LENS, WAFER LEVEL LENS AND IMAGING UNIT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a wafer level lens, the method manufacturing a wafer level lens having high light-shielding performance and preventing ghost and flare due to reflected light while restraining increase in manufacturing cost; and to provide a wafer level lens and an imaging unit. <P>SOLUTION: This invention relates to a method of manufacturing the wafer level lens having at least one lens module including a substrate and a plurality of lenses formed on the substrate. The method includes steps of: applying a black resist layer on the surface of the substrate before forming a lens on the substrate; forming the applied black resist layer in such a pattern that a portion intersecting the optical axis of the lens is open; and subsequently integrally forming the lens on the substrate. Thus, the wafer level lens having high light-shielding performance and preventing ghost and flare due to reflected light can be manufactured while increase in manufacturing cost is restrained. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011081352(A) 申请公布日期 2011.04.21
申请号 JP20100180626 申请日期 2010.08.11
申请人 FUJIFILM CORP 发明人 MARUYAMA YOICHI
分类号 G02B3/00;G02B5/00;G02B7/02;G02B13/00;G03F7/004;H04N5/225 主分类号 G02B3/00
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