| 摘要 |
<p>A film formation apparatus includes: a film forming chamber (11) in which a desired film is formed on a substrate (W) in a vacuum; a loading-ejecting chamber (13) fixed to the film forming chamber (11) with a first opening-closing section (25) interposed therebetween, being capable of reducing an internal pressure so as to form a vacuum atmosphere; a second opening-closing section (36) provided at a face opposite to the face of the loading-ejecting chamber (13) on which the first opening-closing section (25) is provided; and a carrier (21) holding the substrate (W) so that a film formation face of the substrate (W) is substantially parallel to a direction of gravitational force, wherein the carrier (21) or the substrate (W) passes through the second opening-closing section (36), and is transported to the loading-ejecting chamber (13) and is transported from the loading-ejecting chamber (13); a plurality of carriers (21) is disposed in the loading-ejecting chamber (13) in parallel to each other; the plurality of carriers (21) is transported in parallel between the loading-ejecting chamber (13) and the film forming chamber (11); and a film is simultaneously formed on a plurality of substrates (W) that is held by the plurality of carriers (21) in the film forming chamber (11).</p> |
