发明名称 DECOMPRESSION DRIER AND DECOMPRESSION DRY METHOD
摘要 PURPOSE: A decompression drier and a decompression dry method are provided to implement desired film property in a substrate by selecting processes performing decompression dry process of a coating film. CONSTITUTION: In a decompression drier and a decompression dry method, a chamber(224) accommodates a target substrate(G). A maintaining unit is installed in the chamber and supports the target substrate. A first lifting unit(264) lifts up the maintain unit. An airflow control part(260) is installed in the lower part of the maintaining unit. A second lifting unit(278) lifts up the airflow control part.
申请公布号 KR20110026376(A) 申请公布日期 2011.03.15
申请号 KR20100068960 申请日期 2010.07.16
申请人 TOKYO ELECTRON LIMITED 发明人 IKEDA FUMIHIKO;MINE YOUSUKE;OONISHI TATSUMI
分类号 H01L21/302 主分类号 H01L21/302
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