发明名称 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
摘要 PURPOSE: A liquid treating apparatus and a liquid treating method thereof are provided to prevent the treating liquid from sticking to the other side of the substrate after liquid treatment by preventing the treating liquid from remaining on the lift pin. CONSTITUTION: A retaining plate(30) keeps a substrate(W). A lift pin plate(20) includes a lift pin(22) supporting a substrate from underneath. A rotation driving(39) rotates the retaining plate. The treatment liquid supplying unit supplies the treatment liquid to the other side of the substrate maintained by the supporting plate.
申请公布号 KR20110022542(A) 申请公布日期 2011.03.07
申请号 KR20100082559 申请日期 2010.08.25
申请人 TOKYO ELECTRON LIMITED 发明人 OGATA NOBUHIRO;NAGAMINE SHUICHI
分类号 H01L21/302 主分类号 H01L21/302
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