STRIPPER COMPOSITION FOR PHOTORESIST OR PHOTORESIST ASHING RESIDUE AND STRIPPING METHOD OF PHOTORESISTS USING THE SAME

摘要

PURPOSE: A photoresist and photoresist ashing residual stripper composition are provided to effectively remove cured and/or modified photoresist residual and to ensure excellent anti-corrosion effects. CONSTITUTION: A photoresist and photoresist ashing residual stripper composition contains one or more amine compounds selected from the group consisting of a compound of chemical formula 1, a compound of chemical formula 2, and quarternary amine compounds; a compound of chemical formula 3; glycol organic solvents; and water. In chemical formulas 1-3, R1 and R2 are independently hydrogen, carboxy group, linear or branched alkyl group of C1-6, or hydroxy alkyl group of C1-6.