POLYURETHANE COMPOSITION FOR CMP PADS AND METHOD OF MANUFACTURING SAME
摘要
<p>Polyurethane composition based on a certain polyether and polyester prepolymer reaction mixture, wherein the composition is utilized in manufacturing chemical mechanical polishing/planarizing (CMP) pads. The CMP pads have low rebound and can dissipate irregular energy as well as stabilize polishing to yield improved uniformity and less dishing of the substrate.</p>
申请公布号
WO2011016971(A1)
申请公布日期
2011.02.10
申请号
WO2010US42281
申请日期
2010.07.16
申请人
PRAXAIR S.T. TECHNOLOGY, INC.;ZHANG, YONG;HUANG, DAVID;SUN, LU
