发明名称 LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE BY USING THE LITHOGRAPHIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate supported by a table; a liquid handling system configured to supply and confine the immersion liquid to a space defined between a projection system and the table or a substrate, or both of them; and a controller to control a moving speed of the table relative to liquid handling on the basis of a distance between moving direction switches.
申请公布号 JP2011003897(A) 申请公布日期 2011.01.06
申请号 JP20100134782 申请日期 2010.06.14
申请人 ASML NETHERLANDS BV 发明人 DIREKS DANIEL JOSEPH MARIA;KEMPER NICOLAAS R;DANNY MARIA HUBERTUS PHILIPS;RIEPEN MICHEL;CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN;MAIKEL ADRIANUS CORNELIS SCHEPERS
分类号 H01L21/027 主分类号 H01L21/027
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