发明名称 |
LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE APPARATUS, AND METHOD OF MANUFACTURING DEVICE BY USING THE LITHOGRAPHIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate supported by a table; a liquid handling system configured to supply and confine the immersion liquid to a space defined between a projection system and the table or a substrate, or both of them; and a controller to control a moving speed of the table relative to liquid handling on the basis of a distance between moving direction switches. |
申请公布号 |
JP2011003897(A) |
申请公布日期 |
2011.01.06 |
申请号 |
JP20100134782 |
申请日期 |
2010.06.14 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
DIREKS DANIEL JOSEPH MARIA;KEMPER NICOLAAS R;DANNY MARIA HUBERTUS PHILIPS;RIEPEN MICHEL;CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN;MAIKEL ADRIANUS CORNELIS SCHEPERS |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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