SUBSTRATE SUPPORT HAVING SIDE GAS OUTLETS AND METHODS

摘要

A substrate support for a process chamber comprises an electrostatic chuck having a receiving surface to receive the substrate and a gas distributor baseplate below the electrostatic chuck. The gas distributor baseplate comprises a circumferential sidewall having a plurality of gas outlets that are spaced apart from one another to introduce a process gas into the process chamber from around the perimeter of the substrate and in a radially outward facing direction.