DEVICE FOR SUPPLYING WATER CONTAINING DISSOLVED GAS AND PROCESS FOR PRODUCING WATER CONTAINING DISSOLVED GAS

摘要

A device for supplying water containing a dissolved gas and a process for producing water containing a dissolved gas are provided with which it is possible to stably supply dissolved-gas-containing water having a low dissolved-gas concentration (low degree of saturation). Oxygen gas is supplied through gas feed piping (31) to a gas-phase chamber (13), and a vacuum pump (35) is operated simultaneously therewith to evacuate the gas-phase chamber (13). Raw water is supplied through raw-water piping (21) to a liquid-phase chamber (12). Some of the oxygen within the gas-phase chamber (13) permeates a gas-permeable film (11) and dissolves in the raw water within the liquid-phase chamber (12). Thus, water containing a dissolved gas is produced. The remainder of the oxygen within the gas-phase chamber (13) is sucked with the vacuum pump (35) together with condensed water and discharged through discharge piping (33). The dissolved-oxygen concentration of the water containing a dissolved gas is measured with a dissolved-gas meter (23), and the degree of opening of a gas flow control valve (32) is regulated so that the measured concentration becomes a desired value.