REAL-TIME COMPUTER SIMULATION METHOD OF THIN-FILM GROWTH IN DIP-PEN NANOLITHOGRAPHY

摘要

PURPOSE: A real-time computer simulation method of thin-film growth in dip-pen nanolithography is provided to predict the structure of the final thin film by simulating the growth of the thin film under test conditions. CONSTITUTION: A molecular property and simulation conditions are provided from an AFM(Atomic Force Microscope) probe. The number of molecule falling for a unit time and relative velocity of the probe is determined based on the molecular property and simulation conditions. The falling location of molecule dropped from the AFM probe is determined. A random work is performed by falling the molecule from AFM probe.