METHOD FOR FORMING AN ANTIREFLECTIVE GRATING PATTERN, AND METHOD FOR MANUFACTURING AN OPTICAL DEVICE WITH AN INTEGRATED ANTIREFLECTIVE GRATING PATTERN

摘要

The present invention relates to a method for forming an antireflective grating pattern, and to a method for manufacturing an optical device with an integrated antireflective grating pattern. The method for forming an antireflective grating pattern comprises the steps of: forming a photoresist pattern on a substrate by hologram lithography; forming a photoresist lens pattern having a radius of curvature of a predetermined size by enabling a reflow of the photoresist pattern; and etching the entire surface of the substrate including the photoresist lens pattern to form a sharp end wedge-type or parabola-type antireflective grating pattern having a period shorter than the optical wavelength on the upper surface of the substrate. The method of the present invention simplifies the forming process of an antireflective grating pattern, minimizes the reflection of light caused by the difference in refractive indexes between the air and semiconductor material, and can be easily used in the field of optical devices.