发明名称 |
HIGH REPELLENCY MATERIALS VIA NANOTOPOGRAPHY AND POST TREATMENT |
摘要 |
A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like nanotopography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process.
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申请公布号 |
US2010159195(A1) |
申请公布日期 |
2010.06.24 |
申请号 |
US20080343909 |
申请日期 |
2008.12.24 |
申请人 |
QUINCY III ROGER B;YAHIAOUI ALI |
发明人 |
QUINCY, III ROGER B.;YAHIAOUI ALI |
分类号 |
B32B3/00;B05D3/00 |
主分类号 |
B32B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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