发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>PURPOSE: A substrate processing apparatus is provided to reduce an installation space and shorten a substrate processing time by arranging a local processing unit with square shape from an entrance located in one side of an index unit to an exit vertically located in one side of the index part. CONSTITUTION: A local processing unit is arranged with a square shape from an entrance located in one side of an index unit to an exit of the index unit. A substrate rotating unit(300) is positioned on the corner part of the local processing unit. The substrate rotating unit rotates the substrate with 90 angles and leads in a transfer conveyor(C1) of the rear chamber. The Index unit includes a load port(110) placed in a cassette and a transfer unit. The local processing unit includes a moisture processing chamber(210) and a defensive processing chamber. The moisture processing chamber is arranged in the entrance of the index unit.</p>
申请公布号 KR20100059413(A) 申请公布日期 2010.06.04
申请号 KR20080118183 申请日期 2008.11.26
申请人 SEMES CO., LTD. 发明人 YOO, MIN SANG;LEE, SUN YI
分类号 H01L21/677;G02F1/13 主分类号 H01L21/677
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