| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a CF (color filter), having excelling performance in image characteristics, including fine resolution of pixels and sharpness of a pixel, solving the problems such as complicatedness of processes and shortening of the operation time, and easily and economically coping with enlargement and miniaturization of a liquid crystal display. <P>SOLUTION: The method of manufacturing the color filter includes: a process of applying a photodecomposition type positive resist to cover at least a black matrix formed on the surface of a color filter substrate to form a resist layer; a process of exposing the resist layer from the back of the CF substrate; a process of cleaning and removing the resist layer, solubilized by exposure to form a hole space or a groove space (an empty hole) partitioned by a hole wall (a groove wall, a partition) formed of a resist layer remaining on the BM; a process of applying colored ink corresponding to a pixel of the CF to the empty hole to form a colored film; and a process of exposing from the BM side to solubilize and remove the partition wall made of the resist layer. <P>COPYRIGHT: (C)2010,JPO&INPIT |
