摘要 |
<p>This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).</p> |
申请人 |
NATIONAL CENTER FOR SCIENTIFIC RESEARCH ''DEMOKRITOS'';GOGOLIDES, EVANGELOS;TSEREPI, ANGELIKI;CONSTANTOUDIS, VASSILIOS;VOURDAS, NIKOLAOS;BOULOUSIS, GEORGIOS;VLACHOPOULOU, MARIE-ELENA;TSOUGENI, AIKATERINI;KONTZIAMPASIS, DIMITRIOS |
发明人 |
GOGOLIDES, EVANGELOS;TSEREPI, ANGELIKI;CONSTANTOUDIS, VASSILIOS;VOURDAS, NIKOLAOS;BOULOUSIS, GEORGIOS;VLACHOPOULOU, MARIE-ELENA;TSOUGENI, AIKATERINI;KONTZIAMPASIS, DIMITRIOS |