发明名称 |
Lithographic apparatus and method |
摘要 |
A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.
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申请公布号 |
EP2136250(A1) |
申请公布日期 |
2009.12.23 |
申请号 |
EP20090160135 |
申请日期 |
2009.05.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSSEN, FRANCISCUS;LANDHEER, SIEBE;KOEK, YUECEL;BECKERS, MARCEL;THOMAS, IVO;MIRANDA, MARCIO |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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