发明名称 COMPOSITION FOR TREATING ATOPY AND ACNE
摘要 PURPOSE: A composition for treating atopic dermatitis and acne is provided to use as pharmaceutical or sitological composition with high efficiency in treating atopy and acne. CONSTITUTION: A composition for treating atopic dermatitis and acne contains 3-6 weight parts of Poncirus trifoliate Rafinesque, 4-8 weight parts of Atractylodis Rhizoma alba, 4-10 weight parts of Rehmanniae Radix Preparata, 4-8 weight parts of Cnidii Rhizoma, 5-12 weight parts of lithospermi radix, 4-9 weight parts of scutellariae Radix, 6-10 weight parts of Hinoki cypress, 8-15 weight parts of artemisiae capillaries herba, 4-9 weight parts of glycyrrhizae radix, 4-9 weight parts of Paeoniae Radix, and 6-9 weight parts of ulmus davidiana.
申请公布号 KR20090127523(A) 申请公布日期 2009.12.14
申请号 KR20080053549 申请日期 2008.06.09
申请人 CHOI, YANG WON 发明人 CHOI, YANG WON
分类号 A61K36/75;A61K36/284;A61K36/804;A61P17/00 主分类号 A61K36/75
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