发明名称 PRODUCTION METHOD OF SILICON SINGLE CRYSTAL
摘要 A method of growing a single crystal, wherein the yield in terms of specific resistance is improved by improving an effective segregation coefficient without affecting other characteristics, is provided: wherein a seed crystal provided to the lower end of a wire cable is immersed in melt in a crucible, a single crystal ingot is grown on the lower end portion of the seed crystal being elevated by pulling up the wire cable while rotating the same, and a horizontal magnetic field intensity to be applied to the silicon melt is changed in accordance with crystal positions along the growing axis direction of the single crystal ingot, so that an effective segregation coefficient of a dopant along the growing axis direction in the single crystal ingot becomes small.
申请公布号 US2009293801(A1) 申请公布日期 2009.12.03
申请号 US20090473478 申请日期 2009.05.28
申请人 SUMCO CORPORATION 发明人 KURAGAKI SHUNJI
分类号 C30B15/30 主分类号 C30B15/30
代理机构 代理人
主权项
地址