发明名称 FUSE AND METHOD FOR MANUFACTURING THE SAME
摘要 A fuse and a manufacturing method thereof are provided to improve yield of a memory device by preventing damage to a bottom structure during a laser irradiation. A bottom metal contact(206) is connected to one side of a top part of a bottom structure. One side of a bridge layer(208) is connected to a top part of the bottom metal contact. A top contact contact(212) has a gap narrower than a gap of the bottom metal contact. The bottom structure is not overlapped with the top metal contact. The bridge layer is made of material capable of being connected to the bottom metal contact and the top metal contact. A highest bridge layer and a highest metal contact are included between the top metal contact and a metal line(214).
申请公布号 KR20090088678(A) 申请公布日期 2009.08.20
申请号 KR20080014095 申请日期 2008.02.15
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, HAN NAE
分类号 H01L23/62 主分类号 H01L23/62
代理机构 代理人
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