发明名称 ELECTRON BEAM DRAWING DEVICE, METHOD FOR CALCULATING VARIATION AMOUNT OF MOVING STAGE, AND PATTERN DRAWING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron beam drawing device, a method for calculating a variation amount of a moving stage, and a pattern forming method, with which a track interval in the electron beam drawing device is detected, only a variation component necessary for correcting an electron beam irradiation position is accurately detected excluding moving stage variations which show reproducibility, and information on the constant track interval is recorded by changing electron beam irradiation positions according to the variation signal. SOLUTION: The electron beam drawing device 100 includes: a linear encoder 18 detecting a position of a moving stage 16; a rotary encoder 18 detecting a rotation angle of the rotation table 14; a track interval deviation calculating means 21 for obtaining a track interval deviation Ts in a prescribed rotation angle in one rotation of the rotation table 14; and an electron beam irradiation position adjusting means 22 adjusting an irradiation position on a disk substrate 12 by reflecting the track interval deviation Ts obtained by the track interval deviation calculating device 21, in a deflection of an electron beam EB in a scanning electrode 35. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009175302(A) 申请公布日期 2009.08.06
申请号 JP20080012247 申请日期 2008.01.23
申请人 RICOH CO LTD 发明人 ENDO HIDEYASU
分类号 G03F7/20;G11B7/26;H01J37/305;H01L21/027 主分类号 G03F7/20
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