发明名称 OHMIC ELECTRODE FOR SiC SEMICONDUCTOR, METHOD FOR MANUFACTURE OF OHMIC ELECTRODE FOR SiC SEMICONDUCTOR, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 <p>An ohmic electrode (2) for SiC semiconductor that contains Si and Ni or an ohmic electrode (2) for SiC semiconductor that further contains Au or Pt in addition to Si and Ni is provided. In addition, a method of manufacturing the ohmic electrode (2) for SiC semiconductor, a semiconductor device including the ohmic electrode (2) for SiC semiconductor, and a method of manufacturing the semiconductor device are provided.</p>
申请公布号 EP2079101(A1) 申请公布日期 2009.07.15
申请号 EP20070792459 申请日期 2007.08.13
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 FUJIKAWA, KAZUHIRO;TAMASO, HIDETO
分类号 H01L21/28;H01L29/16;H01L29/45 主分类号 H01L21/28
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