| 摘要 |
An apparatus for transferring a wafer is provided to prevent pollution of a wafer due to a fine particle by physically blocking access of the fine particle in the wafer. A first vacuum chamber(110) is connected to a process module. A second vacuum chamber(120) is positioned inside the first vacuum chamber, and includes a robot which transfers a wafer. A moving part moves the second vacuum chamber inside the first vacuum chamber. A first slot valve(215,225,235,245,255,265) opens and closes a path between the process module(210,220,230,240,250,260) and the first vacuum chamber. The second vacuum chamber includes a second slot valve(151,152) in which the wafer enters and leaves. The second slot valve is opened and is closed in a state arranged with the first slot valve. The moving part is positioned outside the second vacuum chamber.
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