发明名称 |
COPPER ALLOY THIN FILMS, COPPER ALLOY SPUTTERING TARGETS AND FLAT PANEL DISPLAYS |
摘要 |
A Cu alloy thin film contains Fe and P with the balance being substantially Cu, in which the contents of Fe and P satisfy all the following conditions (1) to (3), and in which Fe2P is precipitated at grain boundaries of Cu after heat treatment at 200° C. to 500° C. for 1 to 120 minutes: <?in-line-formulae description="In-line Formulae" end="lead"?>1.4NFe+8NP<1.3 (1)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>NFe+48NP>1.0 (2)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>12NFe+NP>0.5 (3)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein NFe represents the content of Fe (atomic percent); and NP represents the content of P (atomic percent).
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申请公布号 |
US2009133784(A1) |
申请公布日期 |
2009.05.28 |
申请号 |
US20090355274 |
申请日期 |
2009.01.16 |
申请人 |
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发明人 |
KUGIMIYA TOSHIHIRO;TOMIHISA KATSUFUMI;TAKAGI KATSUTOSHI;NAKAI JUNICHI |
分类号 |
C22C9/00;B32B15/00;C23C14/34 |
主分类号 |
C22C9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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