发明名称 Multiple frequency plasma chamber, switchable RF system, and processes using same
摘要 An RF power supplier is provided, that enables multiple-frequency RF power. The system uses N RF signal generators, combines the RF signals, amplify the combined signals, and then separates the amplified signal. The output of the system is then a multiple-frequency RF power. Optionally, the frequencies are switchable, so that one may select which frequencies the system outputs.
申请公布号 US7503996(B2) 申请公布日期 2009.03.17
申请号 US20070739785 申请日期 2007.04.25
申请人 ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA 发明人 CHEN JINYUAN;YIN GERALD;QIAN XUEYU;NI TUQIANG;IIZUKA HIROSHI
分类号 C23F1/02 主分类号 C23F1/02
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