发明名称 PATTERN FORMING METHOD AND DROPLET DISCHARGE APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming method in which processing accuracy of a pattern is improved by improving the uniformity of drying state of a functional liquid body, and a droplet discharge apparatus. <P>SOLUTION: When the pattern is formed on a substrate S by discharging ink on the substrate S and irradiating the ink with laser beam B emitted from a laser, thickness and an absorption coefficient (α) are set so as to satisfy 0.1≤α×L≤0.7, wherein the thickness of the ink on the optical axis A of the laser beam B is L and the absorption coefficient of the ink to the laser beam B is (α). <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009034616(A) 申请公布日期 2009.02.19
申请号 JP20070201980 申请日期 2007.08.02
申请人 SEIKO EPSON CORP 发明人 HAMA YOSHIKAZU;MIURA HIROTSUNA
分类号 B05D1/26;B05C5/00;B05C9/12;B05D3/06 主分类号 B05D1/26
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