Polysilicon break, comprises similar structure grown in siemens process, where structure contains pores, splices, fissures, crack and chasms

摘要

The polysilicon break comprises a similar structure grown in the siemens process. The structure contains pores, splices, fissures, crack and chasms with 1-250 mms of break dimensions distribution and 0.7-1.0 of sphericity. An independent claim is also included for a method for manufacturing polysilicon break, which involves carrying out a cleaning of the silicon break in an oxidized washing solution.