发明名称 RESIN COMPOSITION FOR PHOTORESIST
摘要 PURPOSE:To provide satisfactory functions such as high sensitivity and resolving power by combining a diisopropenylbenzene-alpha-methylstyrene copolymer soluble in a solvent and contg. diisopropenylbenzene units by >=1% of the amount of the copolymer with an azobisnitrile compound. CONSTITUTION:The diisopropenylbenzene-alpha-methylstyrene copolymer soluble in the solvent and contg. diisopropenylbenzene units by >=1% of the amount of the copolymer is used. The copolymer contains diisopropenylbenzene and alpha-methylstyrene units by >=60% of all the monomeric units in the copolymer. alpha-Methylstyrene and diisopropenylbenzene combined optionally with other monomer are polymerized in the presence of an anionic polymn. initiator such as an org. lithium or sodium compound. The resulting polymer is separated and dissolved, and the insoluble matter is removed. A soln. contg. the diisopropenylbenzene copolymer and an azobisnitrile compound is coated to a desired place, the solvent is removed by evaporation, and ultraviolet light is irradiated to form a cross-linked composition. Since this composition is perfectly decomposed and volatilized by heating, it is very useful as a photoresist.
申请公布号 JPS61167944(A) 申请公布日期 1986.07.29
申请号 JP19850008762 申请日期 1985.01.21
申请人 MITSUI TOATSU CHEM INC 发明人 ASANUMA TADASHI
分类号 G03F7/038 主分类号 G03F7/038
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