| 摘要 |
A method for manufacturing an LCD(Liquid Crystal Display) driver IC(Integrated Circuit) is provided to laminate first to third spacer material layers on a gate electrode and sequentially perform plasma dry etching and wet etching for selective stripping the spacer material layers, thereby exactly controlling a thickness of the first spacer material layer on an active area where source and drain areas will be formed. A gate insulating layer(210a,210b,210c) and gate electrodes(220a,220b,220c) sequentially laminated are formed on a semiconductor substrate(100). First to third spacer material layers(310L,320L,330L) for covering the gate electrodes are sequentially deposited onto the semiconductor substrate. By plasma dry etching for etch back etching, the first to third spacer material layers are remained on a side wall of the gate electrodes and the first and second spacer material layers are remained on the semiconductor substrate. By wet etching, the second spacer material layer remained on the semiconductor substrate is stripped. A thickness of the first spacer material layer is controlled.
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