发明名称 Bipolar transistor formed using selective and non-selective epitaxy for base integration in a BiCMOS process
摘要 According to one exemplary embodiment, a bipolar transistor includes an active area situated between first and second isolation regions in a substrate. The bipolar transistor further includes an epitaxial extension layer situated on the active area, where the epitaxial extension layer extends over the first and second isolation regions. The bipolar transistor further includes a base layer situated on the epitaxial extension layer, where the base layer includes an epitaxial base, and where the epitaxial base includes a usable emitter formation area. The active area has a first width and the usable emitter formation area has a second width, where the second width is at least as large as the first width.
申请公布号 US7462923(B1) 申请公布日期 2008.12.09
申请号 US20070899850 申请日期 2007.09.08
申请人 NEWPORT FAB, LLC 发明人 U'REN GREG D.
分类号 H01L27/082 主分类号 H01L27/082
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