| 摘要 |
<p>Disclosed are (1) a mesoporous silica film having a mesoporous structure with an average pore interval of 1.5-6 nm, wherein the mesopores are oriented in a direction at 75-90° to the film surface; (2) a structure obtained by forming such a mesoporous silica film on a substrate; and (3) a method for producing a mesoporous silica film structure, wherein an aqueous solution containing a certain amount of a specific cationic surfactant is prepared, a substrate is immersed in the aqueous solution, a certain amount of a silica source for forming a silanol compound by hydrolysis is added thereinto and the resulting is stirred at 10-100°C, thereby forming a mesoporous silica film on the substrate surface, and then the cationic surfactant is removed therefrom.</p> |
