POLISHING COMPOUND FOR POLISHING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20077030868-传众专利搜索

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发明名称	POLISHING COMPOUND FOR POLISHING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR100863088(B1)	申请公布日期	2008.10.13
申请号	KR20077030868	申请日期	2007.12.28
申请人		发明人
分类号	H01L21/304;C09G1/02;C09K3/14;H01L21/3105	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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