发明名称 |
RELEASE LAYER AND RESIST MATERIAL FOR MASTER TOOL AND STAMPER TOOL |
摘要 |
Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.
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申请公布号 |
US2008145525(A1) |
申请公布日期 |
2008.06.19 |
申请号 |
US20060610294 |
申请日期 |
2006.12.13 |
申请人 |
GUO XING-CAI;KERCHER DAN S;MARCHON BRUNO;MATE CHARLES M;WU TSAI-WEI |
发明人 |
GUO XING-CAI;KERCHER DAN S.;MARCHON BRUNO;MATE CHARLES M.;WU TSAI-WEI |
分类号 |
B28B7/36 |
主分类号 |
B28B7/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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