SEMICONDUCTOR DEVICE TOPOLOGY MEASURING METHOD USING ATOMIC FORCE MICROSCOPE

摘要

A method for measuring a topology of a semiconductor device by using an atomic force microscope is provided to search automatically a position of a measuring pattern by identifying an alignment key. A position of an alignment key and a position of a measuring target pattern are measured by using a laser beam(S301). A pattern identification file is generated(S302). An atomic force microscope moves to a next target wafer according to position data of the pattern identification file(S303). The laser beam is irradiated on an upper surface of a cantilever(S304). A photodiode measures an angle of the laser beam reflected from the upper surface of the cantilever(S305). A topology of the pattern corresponding to the measured angle of the photodiode is displayed on a display unit(S306).