发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of efficiently forming a cured film excellent in alkali developability and flame retardancy with high resolution. <P>SOLUTION: The photosensitive resin composition contains (A) a resin soluble in a dilute alkaline aqueous solution, which is a reaction product of (a) an epoxy resin represented by general formula (1), (b) an unsaturated bond-containing monocarboxylic acid and (c) a polybasic carboxylic acid anhydride, (B) a phenoxyphosphazene compound, (C) a compound having at least one ethylenically unsaturated bond, (D) a photopolymerization initiator and (E) a heat curing agent, wherein n represents an average and a number of 0-10; P and R represent H, a 1-8C alkyl group or an aryl group, P and R may be the same or different; and G represents a glycidyl group. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008107458(A) 申请公布日期 2008.05.08
申请号 JP20060288721 申请日期 2006.10.24
申请人 HITACHI CHEM CO LTD 发明人 OTOMO SATOSHI;TSUCHIYA KATSUNORI;OHASHI TAKESHI;YOSHIDA TETSUYA;ITAGAKI SHUICHI;OZAWA KYOKO
分类号 G03F7/027;G03F7/004;H05K3/00;H05K3/28 主分类号 G03F7/027
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