| 摘要 |
A rinse bath with a planar pure water supply plate is provided to improve a manufacturing yield of a semiconductor device by enhancing a rinsing efficiency of a wafer. A rinse bath includes a planar pure water supply plate(20), a pure water supply tube(24), and plural pure water supply units(23). The planar pure water supply plate has a hollow cube-like shape and is arranged under a cassette. A wafer is placed on the cassette. The pure water supply tube is formed at one side of the planar pure water supply plate. Pure water is supplied to the pure water supply tube from outside. The pure water supply units are formed on the pure water supply plate and supply the pure water into the rinse path. The pure water supply units are arranged with an inter-center distance of 5 mm. A diameter of the pure water supply unit lies between 1.5 and 2 mm.
|
