发明名称 |
Light irradiation apparatus, crystallization apparatus, crystallization method, semiconductor device and light modulation element |
摘要 |
A light irradiation apparatus includes a light modulation element which has a phase modulation area having at least one basic pattern for modulating a light beam, an illumination system which illuminates the phase modulation area of the light modulation element with a light beam, and an image formation optical system which causes a light beam on an irradiation target surface a light intensity distribution having an inverse-peak-shaped pattern formed based on the light beam phase-modulated by the phase modulation element to fall on an irradiation target object. Dimensions of the basic pattern are not greater than a point spread function range of the image formation optical system converted in terms of the light modulation element. The phase modulation area is configured in such a manner that a phase distribution in a light complex amplitude distribution on the irradiation target surface becomes a saw-tooth-like distribution along a line segment in a lateral direction.
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申请公布号 |
US7361221(B2) |
申请公布日期 |
2008.04.22 |
申请号 |
US20050210863 |
申请日期 |
2005.08.25 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. |
发明人 |
MATSUMURA MASAKIYO;TANIGUCHI YUKIO |
分类号 |
C30B25/00 |
主分类号 |
C30B25/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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