| 摘要 |
A substrate drying apparatus and a method of use are provided to shorten the time required to transfer a rinsed substrate through a gate installed on an upper surface of a drying chamber which is provided over a rinse bath. A rinse bath(110) is stored with deionized water for rinsing a substrate. A drying chamber(120) is disposed over the rinse bath to dry the rinsed substrate. A gate is installed on the upper portion of the drying chamber through which the substrate accesses to the drying chamber. The gate has a door(132) forming a portion of the upper surface of the drying chamber, a hinge portion(134) engaging the door to the drying chamber, and a driving unit(136) opening the door around the hinge portion.
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