发明名称 PLASMA PROCESSING METHOD AND PHOTOELECTRIC CONVERSION ELEMENT FABRICATED USING THE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve a matter that the electric energy being fed to plasma increases because a high voltage must be applied between the electrodes in order to generate and sustain uniform plasma between the electrodes at a second plasma processing step when a first plasma processing step and the second plasma processing step of higher discharge start voltage are performed in the same plasma reaction chamber. <P>SOLUTION: When pulse modulated AC power is employed in the second plasma processing step of high discharge start voltage, uniform plasma is generated and sustained between the electrodes and the electric energy being fed between the electrodes can be reduced. Consequently, plasma processing speed is lowered and control of processing amount is facilitated. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008004815(A) 申请公布日期 2008.01.10
申请号 JP20060173849 申请日期 2006.06.23
申请人 SHARP CORP 发明人 NAKANO TAKANORI;SANNOMIYA HITOSHI
分类号 H01L21/205;C23C16/517;H01L21/3065;H01L31/04;H05H1/24;H05H1/46 主分类号 H01L21/205
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