NEGATIVE-WORKING RESIST COMPOSITION FOR ELECTRON RAYS OR X-RAYS,申请号KR20010043328-传众专利搜索

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发明名称	NEGATIVE-WORKING RESIST COMPOSITION FOR ELECTRON RAYS OR X-RAYS
摘要
申请公布号	KR100775453(B1)	申请公布日期	2007.11.12
申请号	KR20010043328	申请日期	2001.07.19
申请人		发明人
分类号	G03F7/004;G03F7/038;C08F2/44;C08F2/54;C08F290/00;G03F7/033;G03F7/037;H01L21/027	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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