发明名称 |
Exposure apparatus, exposure method, and method for producing device |
摘要 |
A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
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申请公布号 |
US2007222957(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
US20070802060 |
申请日期 |
2007.05.18 |
申请人 |
NIKON ENGINEERING CO., LTD. |
发明人 |
NAGASAKA HIROYUKI;OKUYAMA TAKESHI |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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